Ion Implanter for LANL

Ion Accelerators & Ion Sources

Ion Implanters, Isotope Separators & Ion Sources
Ion Implanters have over the years confirmed that the Danfysik product philosophy can be expressed in the words "We deliver from source to target". Our program include complete research Ion Implanters, Isotope Separators and Ion Sources.
Isotope Separators equipped with high resolution analysing magnet as well as high current implanters for surface modification of materials is offered.

High current Ion Implanter - Series 1090
The High Current Ion Implanter - Series 1090 is a universal implanter for surface modification of materials with ion beams. It has the versatility in ion species, beam energy, beam intensity and allowed sample geometry, which is a must in process research and development.

Energy range: 5 to 350 keV
Ion masses: 1 to 250 amu
Beam currents: Up to 10 mA
Mass resolution: 150 to 250 depending on beam current, magnetic mass separation
Ion source: Universal high current source model 921A
Optional equipment: Beam lines with magnetic lenses and beam scanning system. Target chamber with water cooled manipulator
Control: Full computer control and monitoring

Universal Isotope Separators
The Universal Isotope Separators are high current high performance electromagnetic isotope separators, which are designed on the basis of the acceleration system in the Series 1090 implanters, but equipped with "state of the art" high performance analysing magnet and Danfysik know how.

Energy range: 2 to 50 keV
Ion masses: 1 to 250 amu
Beam currents: Up to 50 mA
Mass resolution: Up to 2500 depending on beam current and magnet data
Control: Full computer control and monitoring

Ion Sources
Danfysik offers a range of multipurpose ion sources. Whenever there is a need for beam currents in the 10 to 200 mA range we offer our well proven Model 921 "CHORDIS" ion source. This ion source is designed for the production of high current and high brightness ion beams from most of the periodic table. The source is used for applications in particle accelerator injection, ion implantation, isotope separation, ion beam mixing, sputtering, fusion plasma diagnostics etc.

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Ion Implanter for LANL

Description

Danfysik has delivered a Model 1090 - 200 keV Ion Implanter for the Ion Beam Materials Research Laboratory at Los Alamos National Laboratory, New Mexico, USA

Data

Beam energy
From 20 keV to 200 keV
Beam current
From 0.1 to 0.5 mA
Mass analysis
Mass resolution M/Δ
Beam focussing
Beam spot on target 5 mm diameter
Beam scanning
Max. scan area 200 mm x 200 mm

200 keV Ion Implanter for IBML at LANL, New Mexico

Project start 2007. Project completion 2008.

The Ion Beam Materials Laboratory (IBML) is a Los Alamos National Laboratory resource devoted to material research through the use of ion beams. Current major research areas include surface characterization through ion beam analysis techniques, surface modification and materials synthesis through ion implantation technology, and radiation damage studies in gases, liquids and solids.

Danfysik has delivered and installed a 200KeV ion implanter at IBML. The implanter which was installed at the IBML site early in 2008 is equipped with a high current ion source model 921A which operates in gas, vapour or sputter configuration, to produce ions from virtually any element in the periodic tale. Typical operation will be from 20 to 200KeV, but implants up to 800KeV will be possible with multiple-charged ions. The implanter control system allows logging and storage of all parameters for later use. The implanter is delivered with a low-current beam line with two-axis electrostatic beam scanning and a target chamber with sample manipulator.

The installation is prepared for an optional high-current beam line with magnetic scanning, target heating and cooling capacity, which can be added at a later stage.

Link
Ion Beam Laboratory Team