Uppsala University 350KeV Ion Implanter

Ion Accelerators & Ion Sources

Ion Implanters, Isotope Separators & Ion Sources
Ion Implanters have over the years confirmed that the Danfysik product philosophy can be expressed in the words "We deliver from source to target". Our program include complete research Ion Implanters, Isotope Separators and Ion Sources.
Isotope Separators equipped with high resolution analysing magnet as well as high current implanters for surface modification of materials is offered.

High current Ion Implanter - Series 1090
The High Current Ion Implanter - Series 1090 is a universal implanter for surface modification of materials with ion beams. It has the versatility in ion species, beam energy, beam intensity and allowed sample geometry, which is a must in process research and development.

Energy range: 5 to 350 keV
Ion masses: 1 to 250 amu
Beam currents: Up to 10 mA
Mass resolution: 150 to 250 depending on beam current, magnetic mass separation
Ion source: Universal high current source model 921A
Optional equipment: Beam lines with magnetic lenses and beam scanning system. Target chamber with water cooled manipulator
Control: Full computer control and monitoring

Universal Isotope Separators
The Universal Isotope Separators are high current high performance electromagnetic isotope separators, which are designed on the basis of the acceleration system in the Series 1090 implanters, but equipped with "state of the art" high performance analysing magnet and Danfysik know how.

Energy range: 2 to 50 keV
Ion masses: 1 to 250 amu
Beam currents: Up to 50 mA
Mass resolution: Up to 2500 depending on beam current and magnet data
Control: Full computer control and monitoring

Ion Sources
Danfysik offers a range of multipurpose ion sources. Whenever there is a need for beam currents in the 10 to 200 mA range we offer our well proven Model 921 "CHORDIS" ion source. This ion source is designed for the production of high current and high brightness ion beams from most of the periodic table. The source is used for applications in particle accelerator injection, ion implantation, isotope separation, ion beam mixing, sputtering, fusion plasma diagnostics etc.

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Uppsala University 350KeV Ion Implanter

Description

Danfysik has delivered a 350KeV ion implanter for the Ångström Laboratory at Uppsala University, Sweden

Data

Specifications
Beam energy:
Up to350 keV
Beam current:
From 0.1 to 1.0 mA
Mass analysis:
Mass resolution M/Δ
Beam focussing:
Beam spot on target 5 mm diam.
Beam scanning:
Scan area 150 mm x 150 mm

350KeV ion implanter for the Ångström Laboratory at Uppsala University, Sweden

Project start. 2003. Project completion 2004.

A 350 keV, 1mA ion implanter was delivered to the Angstrom Laboratory in Uppsala, Sweden. The implanter was designed and built over a well proven Danfysik basic concept for the model 1090 Ion Implanter, and deliver ion beams of all elements in the period table at currents < 1mA. The lowest energy reachable with a decelerate system is ~50 eV, while the highest energy, E, depends on the charge state q of the extracted ions from the ion source ( E= 350*q keV). An automatic scanning system handling 2, 4 and 6-inch wafers is available. The implanter is equipped with a high current ion source model 921A which operates in gas, vapour or sputter configuration, to produce ions from virtually any element in the periodic tale. The implanter control system allows logging and storage of all parameters for later use. The implanter is delivered with a low-current beam line with two-axis electrostatic beam scanning and a target chamber with sample manipulator.

Link
Ångströmlaboratoriet