Ion Implanters, Isotope Separators & Ion Sources
Ion Implanters have over the years confirmed that the Danfysik product philosophy can be expressed in the words "We deliver from source to target". Our program include complete research Ion Implanters, Isotope Separators and Ion Sources.
Isotope Separators equipped with high resolution analysing magnet as well as high current implanters for surface modification of materials is offered.
High current Ion Implanter - Series 1090
The High Current Ion Implanter - Series 1090 is a universal implanter for surface modification of materials with ion beams. It has the versatility in ion species, beam energy, beam intensity and allowed sample geometry, which is a must in process research and development.
- Energy range: 5 to 350 keV
- Ion masses: 1 to 250 amu
- Beam currents: Up to 10 mA
- Mass resolution: 150 to 250 depending on beam current, magnetic mass separation
- Ion source: Universal high current source model 921A
- Optional equipment: Beam lines with magnetic lenses and beam scanning system. Target chamber with water cooled manipulator
- Control: Full computer control and monitoring
Universal Isotope Separators
The Universal Isotope Separators are high current high performance electromagnetic isotope separators, which are designed on the basis of the acceleration system in the Series 1090 implanters, but equipped with "state of the art" high performance analysing magnet and Danfysik know how.
- Energy range: 2 to 50 keV
- Ion masses: 1 to 250 amu
- Beam currents: Up to 50 mA
- Mass resolution: Up to 2500 depending on beam current and magnet data
- Control: Full computer control and monitoring
Ion Sources
Danfysik offers a range of multipurpose ion sources. Whenever there is a need for beam currents in the 10 to 200 mA range we offer our well proven Model 921 "CHORDIS" ion source. This ion source is designed for the production of high current and high brightness ion beams from most of the periodic table. The source is used for applications in particle accelerator injection, ion implantation, isotope separation, ion beam mixing, sputtering, fusion plasma diagnostics etc.
